F. Felten, J.P. Senateur, F. Weiss, R. Madar, A. Abrutis. Deposition of oxides layers by computer controlled injection-LPCVD. J. Phys. IV France, 5-C5 (1995) 1079-1086.

 F. Felten, J.P. Senateur, M. Labeau, K. Yu-Zhang, A. Abrutis. Deposition of Ta2O5/SiO2 multilayer films by a new process "injection MOCVD". Thin Solid Films. 296 (1997) 79-81.